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PhD Student

Ziyi Pan

Research Interests

Open-air Plasma-deposited Moisture Barriers

Many emerging devices and energy technologies are moisture sensitive and will induce device degradation after in contact with water; therefore, moisture barriers are necessary to prevent water ingress in order to improve device lifetime.

I am working on the development of thin film barrier layers which prevent degradation by inhibiting the diffusion of water. We use atmospheric plasma to deposit our thin film barriers, as it is both a rapid and scalable process. The reactive effluent in the post-nozzle region consists of reactive plasma species, photons, and convective thermal energy, which can induce the plasma polymerization process and form high quality, dense films on the substrate.


  • Zhao, O.; Ding, Y.; Pan, Z.; Rolston, N.; Zhang, J.; Dauskardt, R. H. Open-Air Plasma-Deposited Multilayer Thin Film Moisture Barriers. ACS Appl. Mater. Interfaces 2020.


  • ACS Undergraduate Award in Physical Chemistry (2018)
  • ACS Awards: Excellence in Analytical Chemistry (2017)
  • Eugene & Patricia Kreger Herscher Scholarship (UW-Madison, 2017)
  • Walter W. and Young-Ja C. Toy Scholarship (UW-Madison, 2017)
  • Eugene & Patricia Kreger Herscher Summer Research Scholarship (UW-Madison, 2017)
  • National Scholarship (China, 2015)


Ph.D. Stanford University, Chemistry, in progress
B.S. University of Wisconsin-Madison, Chemistry, 2018



Durand Building, Rm. 111