Atmospheric Plasma Deposition is emerging as a cost-effective and waste free solution to materials synthesis. Using an atmospheric pressure discharge, one can produce thin films of high quality material through the fragmentation and subsequent polymerization of small molecules. A wide range of chemistries are available, resulting in a number of different materials such as silica, metal oxides, nitrides, and even diamond like carbon. By exploring the relationship between plasmas conditions, precursor concentrations, and the ambient environment, we are developing processes to functionalize and coat a number of inorganic and organic surfaces. My personal efforts have focused on the deposition of metal oxide coatings, such as titanium oxide and tantalum oxide, which can be used as various optical layers.